Influence of discrete drop locations on film thickness uniformity in UV- nanoimprint lithography

Author:

Singhal Shrawan,Sreenivasan S.V.

Funder

National Science Foundation

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference37 articles.

1. Nanoscale manufacturing enabled by imprint lithography;Sreenivasan;MRS Bull.,2008

2. Nanoimprint lithography;Chou;J. Vac. Sci. Technol. B,1996

3. Soft lithography;Xia;Annu. Rev. Mater. Sci.,1998

4. Fabrication of nanostructures using a UV-based imprint technique;Bender;Microelectron. Eng.,2000

5. Status of UV imprint lithography for nanoscale manufacturing;Sreenivasan,2011

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1. Discretely-supported nanoimprint lithography for patterning the high-spatial-frequency stepped surface;Nano Research;2021-01-05

2. Droplet spreading nanoimprinting method for micro-/nano-fabrication;Journal of Micromechanics and Microengineering;2020-06-04

3. Gold microelectrodes fabricated by a print-and-imprint method using laser-drilled polyimide through-hole masks;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-11

4. Sub-diffraction-limit fabrication of sapphire by femtosecond laser direct writing;Acta Physica Sinica;2017

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