Influence of discrete drop locations on film thickness uniformity in UV- nanoimprint lithography-Reference-Cited by-同舟云学术

Influence of discrete drop locations on film thickness uniformity in UV- nanoimprint lithography

Published:2016-10 Issue: Volume:164 Page:139-144
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Singhal Shrawan,Sreenivasan S.V.

Funder

National Science Foundation

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference37 articles.

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4. Fabrication of nanostructures using a UV-based imprint technique;Bender;Microelectron. Eng.,2000

5. Status of UV imprint lithography for nanoscale manufacturing;Sreenivasan,2011

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