Author:
Logerais P.O.,Chapron D.,Garnier J.,Bouteville A.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference20 articles.
1. Rapid thermal processing of semiconductors;Borisenko,1997
2. Optimized thermal processing for Ti-capped CoSi2 for 0.13 μm technology
3. Oxidation and nitridation of niobium films by rapid thermal processing
4. Mainstream rapid thermal processing for source–drain engineering from first applications to latest results
5. J.L. Ebert, D. De Roover, L.L. Porter II, V.A. Lisiewicz, S. Ghosal, R.L. Kosut, A. Emami-Naeini, in: Proceedings of the American Control Conference, 5, 2004, 3910–3921.
Cited by
12 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献