Thermal imprint lithography using sub-micron sized nickel template coated with thin SiO2 layer-Reference-Cited by-同舟云学术

Thermal imprint lithography using sub-micron sized nickel template coated with thin SiO2 layer

Published:2007-05 Issue:5-8 Volume:84 Page:1003-1006
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Byeon Kyeong-Jae,Yang Ki-Yeon,Lee Heon

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. Nanoimprint lithography for the fabrication of DNA electrophoresis chips

2. NIL—a low-cost and high-throughput MEMS fabrication method compatible with IC manufacturing technology

3. Large area direct nanoimprinting of SiO[sub 2]–TiO[sub 2] gel gratings for optical applications

4. Production of structures for microfluidics using polymer imprint techniques

5. Wafer to wafer nano-imprinting lithography with monomer based thermally curable resin

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