Fabrication of silicon vertical taper structures using KOH anisotropic etching-Reference-Cited by-同舟云学术

Fabrication of silicon vertical taper structures using KOH anisotropic etching

Published:2006-04 Issue:4-9 Volume:83 Page:1430-1433
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Holly Roman,Hingerl Kurt

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference3 articles.

1. R. Baets, W. Bogaerts, D. Taillaert, P. Dumon, P. Bienstman, D. Van Thourhout, J. Van Campenhout, V. Wiaux, J. Wouters, S. Beckx, in: Proceedings of the International School of Quantum Electronics, 39th course ”Microresonators as Building Blocks for VLSI Photonics”, vol. 709, Italy, 2003, pp. 308–327.

2. Fabrication and characterization of three-dimensional silicon tapers

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