Author:
Loquet Yannick,Mignot Yann,Waskiewicz Christopher,Chen James Hsueh-Chung,Sankarapandian Muthumanickam,Chen Shyng-Tsong,Flaitz Philip,Tomizawa Hideyuki,Tseng Chia-Hsun,Beard Marcy,Morris Bryan,Kleemeier Walter,Liniger E.,Spooner Terry
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. M. Colburn, et al., Double Patterning Lithography Overlay Components, in: 6th Intl Symp. on Immersion Lithography Extensions, Prague, 2009.
2. Engine for characterization of defects, overlay, and critical dimension control for double exposure processes for advanced logic nodes
3. C.S. Kay, et al., Automated optimized overlay sampling for high-order processing in double patterning lithography, Proc. SPIE 7638 (2010).
4. S. Holmes, et al., Towards manufacturing of advanced logic devices by double-patterning, Proc. SPIE, 7973 (2011) 79730F.
Cited by
7 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献