Hybridization of ellipsometry and XPS energy loss: Robust band gap and broadband optical constants determination of SiGe, HfON and MoOx thin films-Reference-Cited by-同舟云学术

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Hybridization of ellipsometry and XPS energy loss: Robust band gap and broadband optical constants determination of SiGe, HfON and MoOx thin films

Published:2024-01 Issue: Volume:283 Page:112117
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Levert Théo,Zakhtser Alter,Duval Julien,Raguenez Chloé,Verdier Stéphane,Le Cunff Delphine,Tortai Jean-Hervé,Pelissier Bernard

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference45 articles.

1. Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring;Huang;Thin Solid Films,2004

2. Small angle x-ray scattering metrology for sidewall angle and cross section of nanometer scale line gratings;Hu;J. Appl. Phys.,2004

3. Review on grazing incidence X-ray spectrometry and reflectometry;Stoev;Spectrochim. Acta B At. Spectrosc.,1999

4. Overview of Scatterometry applications in high volume silicon manufacturing;Raymond;AIP Conf. Proc.,2005

5. Data analysis for spectroscopic ellipsometry;Jellison;Thin Solid Films,1993

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