Estimation of resist profile for line/space patterns using layer-based exposure modeling in electron-beam lithography-Reference-Cited by-同舟云学术

Estimation of resist profile for line/space patterns using layer-based exposure modeling in electron-beam lithography

Published:2011-06 Issue:6 Volume:88 Page:902-908
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Dai Q.,Lee S.-Y.,Lee S.H.,Kim B.-G.,Cho H.-K.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. Process optimization and proximity effect correction for gray scale e-beam lithography

2. PROXECCO—Proximity effect correction by convolution

3. Proximity effect correction using pattern shape modification and area density map for electron-beam projection lithography

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