Corrigendum to: “Duty ratio impact on SiN films deposited in SiH4-NH3 plasma at room temperature” [Microelectron. Eng. 89 (2011) 116–119]
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Published:2014-01
Issue:
Volume:113
Page:10
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ISSN:0167-9317
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Container-title:Microelectronic Engineering
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language:en
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Short-container-title:Microelectronic Engineering
Author:
Kim Daehyun,Kim Byungwhan,Yoon Neung-Goo
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials