Formation of micro- and nanostructures with well-rounded profile by new e-beam lithography principle-Reference-Cited by-同舟云学术

Formation of micro- and nanostructures with well-rounded profile by new e-beam lithography principle

Published:2016-04 Issue: Volume:155 Page:92-96
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Bruk M.A.,Zhikharev E.N.,Rogozhin A.E.,Streltsov D.R.,Kalnov V.A.,Averkin S.N.,Spirin A.V.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Diffracrive Nanophotonics, ed. by V.A. Soifer. CRC Press, Taylor & Francis Group, CISP, Boca Raton, 2014. (679 pp.)

2. The study on 3D electron beam lithography for sub-micrometer diffractive optics;Yin;Optical MEMS and Nanophotonics,2016

3. Analysis and optimization of fabrication of continuous-relief diffractive optical elements;Hessler;Appl. Opt.,1998

4. Method of masking pattern formation in positive e-beam resist layers, Russian Federation patent 2478226, 2013;Bruk;Russ. Bull. Invent.,2013

5. The new dry method of mask (relief) formation by direct electron-beam etching of resist;Bruk;Microelectron. Eng.,2013

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