Evaluation of Air Gap structures produced by wet etch of sacrificial dielectrics: Critical processes and reliability of Air Gap formation-Reference-Cited by-同舟云学术

Evaluation of Air Gap structures produced by wet etch of sacrificial dielectrics: Critical processes and reliability of Air Gap formation

Published:2007-11 Issue:11 Volume:84 Page:2587-2594
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Schulze K.,Schulz S.E.,Gessner T.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. K. Schulze, S.E. Schulz, M. Rennau, T. Gessner, in: Proceedings of the Materials for Advanced Metallization Conference (MAM) 2006, published in Microelectronic Engineering 83 (2006), pp. 2324–2328.

2. Z. Stich, W. Gabric, W. Pamler, in: Proceedings of the Materials for Advanced Metallization Conference (MAM) 2005, published in Microelectronic Engineering 82 (2005), pp. 362–367.

3. R. Daamen, G.J.A.M. Verheijden, P.H.L. Bancken, T. Vandeweyer, J. Michelon, V. Nguyen Hoang, R.J.O.M. Hoofman, M.K. Gallagher, in: Proceedings of the International Interconnect Technology Conference (IITC) 2005, pp. 240–242.

4. K. Schulze, S.E. Schulz, T. Gessner, in: Proceedings of the Advanced Metallization Conference (AMC) 2006, pp. 445–451.

5. L.G. Gosset, V. Arnal, C. Prindle, R. Hoofman, G. Verheijden, R. Daamen, L. Broussous, F. Fusalba, M. Assous, R. Chatterjee, J. Torres, D. Gravesteijn, K.C. Yu, in: Proceedings of the IITC 2003, pp. 65–67.

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