Multibeam electron source for nanofabrication using electron beam induced deposition-Reference-Cited by-同舟云学术

Multibeam electron source for nanofabrication using electron beam induced deposition

Published:2006-04 Issue:4-9 Volume:83 Page:771-775
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

van Bruggen M.J.,van Someren B.,Kruit P.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Direct fabrication of nanowires in an electron microscope

2. High-resolution electron-beam induced deposition

3. Synthesis of uniform GaN quantum dot arrays via electron nanolithography of D2GaN3

4. Focused-electron-beam-induced deposition of freestanding three-dimensional nanostructures of pure coalesced copper crystals

5. The size dependence of the nano-dots formed by electron-beam-induced deposition on the partial pressure of the precursor

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