Contour offset algorithm for precise patterning in two-photon polymerization-Reference-Cited by-同舟云学术

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Contour offset algorithm for precise patterning in two-photon polymerization

Published:2005-04 Issue:3-4 Volume:77 Page:382-388
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Lim Tae Woo,Park Sang Hu,Yang Dong-Yol

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Rapid sub-diffraction-limit laser micro/nanoprocessing in a threshold material system

2. Three-dimensional microfabrication with two-photon-absorbed photopolymerization

3. Two-photon-absorbed near-infrared photopolymerization for three-dimensional microfabrication

4. Three-dimensional photonic crystal structures achieved with two-photon-absorption photopolymerization of resin

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2. Round-robin testing of commercial two-photon polymerization 3D printers;Additive Manufacturing;2023-08

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4. Machine learning to optimize additive manufacturing for visible photonics;Nanophotonics;2023-03-17

5. Recent Advances on High‐Speed and Holographic Two‐Photon Direct Laser Writing;Advanced Functional Materials;2023-02-22

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