Revised fabrication process for micro-fluxgate-magnetometers: Usage of electrodepositable photoresist-Reference-Cited by-同舟云学术

Revised fabrication process for micro-fluxgate-magnetometers: Usage of electrodepositable photoresist

Published:2008-05 Issue:5-6 Volume:85 Page:1047-1049
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Kirchhoff Maren R.,Güttler Jens,Waldschik Andreas,Feldmann Marco,Büttgenbach Stephanus

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. The fluxgate magnetometer

2. 2nd International Colloquium of the Collaborative Research Center 562, Robotic Systems for Hand-ling and Assembly;Büttgenbach,2005

3. J. Güttler, P. Last, R. Otremba, S. Büttgenbach, IEEE Sensors, Irvine, California, USA, 2005, pp. 53–56.

4. Advances in fluxgate sensors

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