Comparison of HF and HCl cross-contamination between different ENTEGRIS FOUP platforms and Cu-coated wafers

Author:

Herrán Fernando,González-Aguirre Paola,Beitia Carlos,Ohlsen Jim,Lundgren Jorgen,Fontaine Hervé

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. Case study of micro-contamination control;Li;Aerosol Air Qual. Res.,2007

2. The Influence and Measurement of Airborne Molecular Contaminants in Advanced Semiconductor Processing;Ayre,2005

3. Airborne molecular contamination: cleanroom control strategies;Higley;Solid State Technology,1996

4. Controlling ambient gas in slot-to-slot space inside FOUP to suppress Cu-loss after dual damascene patterning;Kamoshima;IEEE Trans. Semicond. Manuf.,2008

5. Comprehensive study on Metal-Fluoride Crystals issues with Trench First Hard Mask Backend architecture;Lagha,2007

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