Reduction of polarization and swing effects in a high numerical aperture exposure system by utilizing resist antireflective coatings-Reference-Cited by-同舟云学术

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Reduction of polarization and swing effects in a high numerical aperture exposure system by utilizing resist antireflective coatings

Published:2009-01 Issue:1 Volume:86 Page:83-87
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Chen H.L.,Lee W.H.,Fan Wonder,Chuang S.Y.,Lai Y.H.,Lee C.C.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. International Technology Roadmap for Semiconductors, 2006 (Updated).

2. High-NA lithographic imagery at Brewster's angle

3. Challenges in high NA, polarization, and photoresists

4. High-NA swing curve effects

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