Author:
Croisy Marion,Pargon Erwine,Jenny Cécile,Richard Claire,Guiheux Denis,Joblot Sylvain,Campo Alain,Possémé Nicolas
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference17 articles.
1. A dry process for stripping As+ ion-implanted photoresist;Kikuchi;Jpn. J. Appl. Phys.,1992
2. Characterization and development of high dose implanted resist stripping processes;Croisy;Solid State Phenom.,2016
3. Blisters Formation Mechanisms During High Dose Implant Stripping in 28 nm FDSOI Technology Node;Jenny,2015
4. James F. Ziegler, Stopping Range of Ions in Matter.
5. Role of strain in the blistering of hydrogen-implanted silicon;Lee;Appl. Phys. Lett.,2006