Improvement in the aspect ratio of fabricated minute dots by the volume change thermal lithography technique-Reference-Cited by-同舟云学术

Improvement in the aspect ratio of fabricated minute dots by the volume change thermal lithography technique

Published:2005-03 Issue: Volume:78-79 Page:359-363
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Kuwahara M.,Kim J.H.,Fons P.,Tominaga J.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Progress in Electron Beam Mastering of 100 Gbit/inch2Density Disc

2. Acid-Breakable Resin-Based Chemical Amplification Positive Resist for Electron-Beam Mastering: Design and Lithographic Performance

3. Electron Beam Recorder with Nanometer-Scale Accuracy for 100 Gbit/in2Density Mastering

4. Manufacture of 27 GB Read-Only-Memory Disc Using Deep-UV Beam Recorder with Two-Dimensional Optical Compensation

5. Liquid Immersion Deep-UV Optical Disc Mastering for Blu-ray Disc Read-Only Memory

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1. Binary codes storage and data encryption in substrates with single proton beam writing technology;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-07

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3. High-Speed Fabrication of Super-Resolution Near-Field Structure Read-Only Memory Master Disc using PtOxThermal Decomposition Lithography;Japanese Journal of Applied Physics;2006-02-24