Author:
Charpin-Nicolle C.,de Luca A.,Persico A.,Médico G.,Tallaron C.,Aussenac F.,Kies R.,Molas G.,Masoero L.,Cueto O.,de Salvo B.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. T. Tanaka et al., in: Symp. On VLSI Circ. 2003, pp. 211–212.
2. J. Yater et al., in: Proc. of IMW, 2011, pp. 79–82.
3. G. Chindalore et al., in: Sym. On VLSI Tech., 2008, pp. 136–137.
4. L. Masoero et al., Scalability of split-gate charge trap memories down to 20nm for low-power embedded memories, in: IEDM, 2011.
5. L. Masoero et al., Physical understanding of program injection and consumption in ultra-scaled SiN Split-Gate memories, in: IMW, 2012.
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献