Multilayer thin film capacitors by selective etching of Pt and Ru electrodes-Reference-Cited by-同舟云学术

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Multilayer thin film capacitors by selective etching of Pt and Ru electrodes

Published:2015-02 Issue: Volume:133 Page:92-97
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Hamm Steven C.,Currano Luke,Gangopadhyay Shubhra

Funder

U.S. Office of Naval Research

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. X. Jianwen, C.P. Wong, Int. Symp. Adv. Packag. Mater.: Processes, Prop. Interfaces, 9th. 2004, pp. 158–170.

2. Electrode Defects in Multilayer Capacitors Part I: Modeling the Effect of Electrode Roughness and Porosity on Electric Field Enhancement and Leakage Current

3. Base-Metal Electrode-Multilayer Ceramic Capacitors: Past, Present and Future Perspectives

4. Trends in the ultimate breakdown strength of high dielectric-constant materials

5. Electrical Properties of BaTiO3-Based Multilayer Ceramic Capacitors Sintered with Plasma-Treated Glass Powder

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