Irregular film thickness distribution in C4F8 inductively coupled plasma polymer deposition

Author:

Volland Burkhard E.,Hauguth Maik,Ishchuk Valentyn,Rangelow Ivo W.,Goodyear Andrew L.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Mechanisms of deposition and etching of thin films of plasma‐polymerized fluorinated monomers in radio frequency discharges fed with C2F6‐H2and C2F6‐O2mixtures

2. B.E. Volland, Profile simulations of gas chopping etching processes - Model development and comparison with experiments, Dissertation Universität Kassel, URN: urn:nbn:de:hebis:34-1167, 2004. URL: http://kobra.bibliothek.uni-kassel.de/bitstream/urn:nbn:de:hebis:34-1167/1/dis2498_18.pdf.

3. Aspect ratio dependent plasma polymer deposition of fluorocarbons

4. Plasma Polymerization of Fluorocarbons;d’Agostino,1990

5. New method for the precise flux calculation of neutrals for arbitrary surfaces in profile etch simulations

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