Sub-micron imaging on high-topography wafers using spray coating and projection lithography-Reference-Cited by-同舟云学术

Sub-micron imaging on high-topography wafers using spray coating and projection lithography

Published:2010-05 Issue:5-8 Volume:87 Page:904-906
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Maury Pascale,Quemper Jean-Marie,Pocas Stephane,Vliet Dick Van,Noordam Nico,Berge Peter ten,Best Keith

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference4 articles.

1. SEMI, San Jose, Semiconductor International, 6/20/2008.

2. EEE Times, 01/07/2008.

3. Spray coating of photoresist for pattern transfer on high topography surfaces

4. Photoresist coating and patterning for through-silicon via technology

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