Oxide–nitride–oxide layer optimisation for reliable embedded SONOS memories-Reference-Cited by-同舟云学术

Oxide–nitride–oxide layer optimisation for reliable embedded SONOS memories

Published:2004-04 Issue:1-4 Volume:72 Page:395-398
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

van Schaijk Rob,van Duuren Michiel,Yuet Mei Wan,van der Jeugd Kees,Rothschild Aude,Demand Marc

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. A. Goda, M. Noguchi, in: Proceedings of the IEEE NVSMW, Monterey, USA, February 2003, p. 65

2. H. Maes, et al., in: Proceedings of the IEEE NVSMW, Monterey, USA, February 2003, p. 7

3. M. van Duuren, et al., in: Proceedings of the IEEE NVSMW, Monterey, USA, February 2003, p. 73

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