Investigation of eccentric PVA brush behaviors in post-Cu CMP cleaning-Reference-Cited by-同舟云学术

Investigation of eccentric PVA brush behaviors in post-Cu CMP cleaning

Published:2012-12 Issue: Volume:100 Page:20-24
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Sun T.,Zhuang Y.,Li W.,Philipossian A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. Electron mobility in GaSb

2. Postchemical‐Mechanical Planarization Cleanup Process for Interlayer Dielectric Films

3. Removal of Submicrometre Alumina Particles from Silicon Oxide Substrates

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