Nanofabrication by field-emission scanning probe lithography and cryogenic plasma etching-Reference-Cited by-同舟云学术

Nanofabrication by field-emission scanning probe lithography and cryogenic plasma etching

Published:2018-05 Issue: Volume:192 Page:77-82
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Lenk Claudia^ORCID,Hofmann Martin,Lenk Steve,Kaestner Marcus,Ivanov Tzvetan,Krivoshapkina Yana,Nechepurenko Diana,Volland Burkhard,Holz Mathias,Ahmad Ahmad,Reum Alexander,Wang Chen,Jones Mervyn,Durrani Zahid,Rangelow Ivo W.

Funder

Seventh Framework Programme

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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