Plasmonic ‘top-hat’ nano-star arrays by electron beam lithography-Reference-Cited by-同舟云学术

Plasmonic ‘top-hat’ nano-star arrays by electron beam lithography

Published:2015-05 Issue: Volume:139 Page:13-18
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Zhu Shaoli,Cheng Han-Hao,Blakey Idriss,Stokes Nicholas,Ostrikov Kostya (Ken),Cortie Michael

Funder

University of Queensland

University of Technology Sydney

Australian Research Council

CSIRO OCE Science Leadership Program

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. Novel dry-developed focused ion beam lithography scheme for nanostructure applications

2. Nanostructure fabrication by electron beam lithography on insulating substrates using a novel four-layer resist

3. Sub-0.1 μ electron-beam lithography for nanostructure development

4. Nanoimprint lithography: An old story in modern times? A review

5. Preparation of nanoscale gold structures by nanolithography

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