Molecular dynamics study of the effect of water lubrication three-body polishing sapphire
Author:
Funder
National Natural Science Foundation of China
Publisher
Elsevier BV
Subject
Materials Chemistry,Mechanics of Materials,General Materials Science
Reference38 articles.
1. Chemical mechanical polishing: theory and experiment;Zhao;Friction,2013
2. Scratch formation and its mechanism in chemical mechanical planarization (CMP);Kwon;Friction,2013
3. Research progress of chemical mechanical polishing solution for sapphire;Minghui;Electroplat. Finish.,2022
4. Effects of slurry pH on chemical and mechanical actions during chemical mechanical polishing of YAG;Mu;Appl. Surf. Sci.,2021
5. Controllable material removal behavior of 6H-SiC wafer in nanoscale polishing;Luo;Appl. Surf. Sci.,2021
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