Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference6 articles.
1. Nikawa K. Failure analysis case studies using the IR-OBIRCH (infrared optical beam induced resistance change) method. In: IEEE, 1999. p. 394–9.
2. Nikawa K, Inoue S. European symposium on reliability of electron devices, failure physics and analysis, Adera, France, 1995. p. 307–12.
3. Inuzuka E, Suzuki H. Emission microscopy in semiconductor failure. In: Proc of the IMTC/94, vol. 3, 1994. p. 1492–6.
4. Light emission microscopy for reliability studies;Leroux;Microelectron Eng,1999
5. Introduction to focused ion beams: instrumentation, theory, techniques and practice;Giannuzzi,2004