Stability of thin film resistors – Prediction and differences base on time-dependent Arrhenius law

Author:

Kuehl Reiner W.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. Kuehl RW. Piezoresistive effects on chip resistor application in SMT. In: Proceedings CARTS-Europe ’98; 1998. p. 83-91.

2. Coleman M. Ageing mechanism and stability in thick film resistors. In: Proceedings of the Fourth European Hybrid Microelectronics Conference, Copenhagen (Denmark); May 1983. p. 20–30.

3. Thick film resistors with IrO2 and CaIrxTi1−xO3 – examples of chemically reactive and unreactive systems;Dziedzic;Microelectron J,1989

4. Stability of tantalum nitride thin film resistors;Au;J Mater Res,1990

5. A new approach to the study of the intrinsic ageing kinetics of thick film resistors;De Schepper;Hybrid Circuits,1990

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