1. International Technology Roadmap for Semiconductors 2005 Edition Interconnect;ITRS,2005
2. Electrical reliability challenges of advanced low-k dielectrics;Wu;ECS J. Solid State Sci. Technol.,2015
3. Analysis of electromigration failure of nano-interconnects through a combination of modeling and experimental methods;Ceric;Microelectron. Reliab.,2019
4. Critical ultra low-k TDDB reliability issues for advanced CMOS technologies;Chen,2009
5. Fundamental FEOL reliability: defect generation in gate dielectrics to induce dielectric breakdown and device degradation (tutorial);Okada,2017