1. High-κ gate dielectrics: current status and materials properties considerations;Wilk;J Appl Phys,2001
2. High-κ gate dielectrics;Houssa,2003
3. High dielectric constant materials – VLSI MOSFET applications;Huff,2005
4. Groeseneken G, Pantisano L, Ragnarsson L-Å, Degraeve R, Houssa M, Kaureauf T, et al. Achievements and challenges for the electrical performance of MOSFETs with high-κ gate dielectrics. In: Proceedings of the IEEE IPFA conference 2004. p. 147–51.
5. Young EWA. The high-κ challenges in CMOS advanced gate dielectric process integration. In: Proceedings of semiconductor silicon, The Electrochem Soc Ser PV 2002-2, 2002. p. 735–40.