Effect of electric field polarity on inter-poly dielectric during cell operation for the retention characteristics-Reference-Cited by-同舟云学术

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Effect of electric field polarity on inter-poly dielectric during cell operation for the retention characteristics

Published:2015-04 Issue:5 Volume:55 Page:795-798
ISSN:0026-2714
Container-title:Microelectronics Reliability
language:en
Short-container-title:Microelectronics Reliability

Author:

Moon Pyung,Lim Jun Yeong,Youn Tae-Un,Noh Keum-Whan,Yun Ilgu

Funder

SK Hynix Semiconductor, Inc.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Introduction to flash memory

2. Flash memory cells-an overview

3. Dielectric Breakdown and Current Conduction of Oxide/Nitride/Oxide Multi‐Layer Structures

4. Thickness scaling limitation factors of ONO interpoly dielectric for nonvolatile memory devices

5. Mori S, Yasushisa N, Yanase T, Sato M, Yoshikawa K, Nozawa H. In: VLSI tech; 1986. p. 71–2.

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