Author:
Tonchev Svetlen,Parriaux Olivier
Subject
Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference19 articles.
1. M.S. Rahman, Reliability of advanced dielectrics in gate oxide and device level packaging in MEMS, January, 2009. Available electronically from http://hdl.handle.net/10106/2014.
2. A survey on the reactive ion etching of silicon in microtechnology;Janseny;Journal of Micromechanics and Microengineering,1996
3. Deeply-etched two-dimensional grating in a Ta2O5 guiding layer for very narrow spectral filtering;Talneau;Microelectronic Engineering,2010
4. Plasma etching of high-κ and metal gate materials;Nakamura;Vacuum,2006
5. Spatially and polarization resolved plasmon mediated transmission through continuous metal films;Jourlin;Optics Express,2009
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