Atomic layer deposited Mo2N thin films using Mo(CO)6 and NH3 plasma as a Cu diffusion barrier-Reference-Cited by-同舟云学术

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Atomic layer deposited Mo2N thin films using Mo(CO)6 and NH3 plasma as a Cu diffusion barrier

Published:2021-03 Issue: Volume:858 Page:158314
ISSN:0925-8388
Container-title:Journal of Alloys and Compounds
language:en
Short-container-title:Journal of Alloys and Compounds

Author:

Joo Yong-Hwan,Nandi Dip K.,Ramesh Rahul,Jang Yujin,Bae Jong-Seong,Cheon Taehoon,Kim Soo-Hyun

Funder

Ministry of Trade, Industry and Energy

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials

Reference42 articles.

1. Properties and microelectronic applications of thin films of refractory metal nitrides;Wittmer;J. Vac. Sci. Technol. A,1985

2. Application of transition metal carbides and nitrides in industrial tools;Santhanam,1996

3. Synthesis, electron transport properties of transition metal nitrides and applications;Ningthoujam;Prog. Mater. Sci.,2015

4. Nanostructured transition metal nitrides for energy storage and fuel cells;Dong;Coord. Chem. Rev.,2013

5. Recent advances of two-dimensional transition metal nitrides for energy storage and conversion applications;Zheng;FlatChem,2020

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition;Journal of Vacuum Science & Technology A;2024-02-29

2. NH₃ plasma-etching-derived porous N-doped carbon nanotubes with FeP nanoparticles and intrinsic carbon defects for boosting oxygen reduction in rechargeable Zn–air batteries;Inorganic Chemistry Frontiers;2024

3. Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H2/N2/Ar plasma;Journal of Vacuum Science & Technology A;2023-09-12

4. Chemical conversion of MoS2 thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by in situ reflectance measurements;Journal of Vacuum Science & Technology A;2023-07-31

5. Electron and Ar+ interaction with Mo(CO)6 at thermal energies; energetic limit on removal of 5 ligands from Mo(CO)6+;The Journal of Chemical Physics;2023-07-24

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