Influence of high energy ion irradiation on structural, morphological and optical properties of high-k dielectric hafnium oxide (HfO2) thin films grown by atomic layer deposition-Reference-Cited by-同舟云学术

Influence of high energy ion irradiation on structural, morphological and optical properties of high-k dielectric hafnium oxide (HfO2) thin films grown by atomic layer deposition

Published:2020-08 Issue: Volume:831 Page:154698
ISSN:0925-8388
Container-title:Journal of Alloys and Compounds
language:en
Short-container-title:Journal of Alloys and Compounds

Author:

Kumar Rajesh,Chauhan Vishnu,Koratkar N.,Kumar Shalendra,Sharma Aditya,Chae Keun-Hwa,Won Sung Ok

Funder

Inter University Accelerator Centre (IUAC), New Delhi, India

FRGS

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials

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5. Electronic energy loss (Se) sensitivity of electrochemically synthesized free-standing Cu nanowires irradiated by 120 MeV high energy ion beam of different atomic mass;Gupta;Appl. Phys. A,2019

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