Impact of Mo doping on photo-sensing properties of ZnO thin films for advanced photodetection applications
Author:
Funder
Deanship of Scientific Research, King Khalid University
King Khalid University
Publisher
Elsevier BV
Reference94 articles.
1. Chapter 1 - Nanostructured thin films–background, preparation and relation to the technological revolution of the 21st century;Benelmekki,2019
2. Review Article: tracing the recorded history of thin-film sputter deposition: From the 1800s to 2017;Greene;J. Vac. Sci. Technol. A,2017
3. Structure and properties of silver clusters implanted in PET by PVD sputtering for active packaging applications;Benelmekki;J. Nano Res.,2012
4. Solution-processable metal oxide semiconductors for thin-film transistor applications;Thomas;Chem. Soc. Rev.,2013
5. Hybrid polymer–metal oxide thin films for photovoltaic applications;Bouclé;J. Mater. Chem.,2007
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