The effect of substrate and annealing temperatures on the microstructure of La1.85Sr0.15CuO4 thin film in pulsed electron deposition process
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials
Reference10 articles.
1. Pulsed-electron-beam deposition of transparent conducting SnO2 films and study of their properties
2. Preparation of dense films of crystalline ZrO2by intense pulsed‐electron‐beam ablation
3. Composite WO3–TiO2 films prepared by pulsed electrodeposition: morphological aspects and electrochromic behavior
4. Deposition of MBa2Cu3O7-xthin films by channel-spark method
5. High Quality<tex>$rm SmBa_2rm Cu_3rm O_7hbox -delta$</tex>Thin Films on<tex>$rm SrTiO_3$</tex>
Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Backward-Like Rectifying Behavior of La1.85Sr0.15CuO4/Nb:SrTiO3 Heterojunctions;Journal of Superconductivity and Novel Magnetism;2012-01-14
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