Thermodynamic modeling of the germanium–nickel system
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials
Reference30 articles.
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2. Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology
3. Nickel silicides and germanides: Phases formation, kinetics and thermal expansion
4. Silicide and germanide technology for contacts and gates in MOSFET applications
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