Effect of growth and annealing temperatures on crystallization of tantalum pentoxide thin film prepared by RF magnetron sputtering method
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials
Reference23 articles.
1. Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications
2. Design of ion-implanted MOSFET's with very small physical dimensions
3. Dielectric constants of Ta2O5 thin films deposited by r.f. sputtering
4. Thin RF sputtered and thermal Ta2O5 on Si for high density DRAM application
5. Optical and durability properties of infrared transmitting thin films
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