Temperature dependence of the internal mechanical stresses in the Si-SiO2 system-Reference-Cited by-同舟云学术

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Temperature dependence of the internal mechanical stresses in the Si-SiO2 system

Published:1982-11 Issue:1 Volume:14 Page:122-127
ISSN:0378-5963
Container-title:Applications of Surface Science
language:en
Short-container-title:Applications of Surface Science

Author:

Jarosz M.,Kocsányi L.,Giber J.

Publisher

Elsevier BV

Subject

General Engineering

Reference16 articles.

1. Dynamic micromechanics on silicon: Techniques and devices

2. Stresses in Thin Films;Wilcock,1967

3. Mechanical Properties of Thin Films;Campbell,1970

4. The Mechanical Properties of Thin Condensed Films;Hoffman,1966

5. Physics of Nonmetallic Thin Films;Hoffman,1976

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mechanical Stresses in SiO2 of Polycrystalline Si;physica status solidi (a);2000-01

2. Annealing effects in undoped and phosphorus doped low temperature oxide layers;Materials Science and Technology;1995-11

3. Determination of thickness, refractive indices, optical anisotropy of, and stresses in SiO2 films on silicon wafers;Optics Communications;1995-05

4. Structural relaxation ofPbdefects at the (111)Si/SiO2interface as a function of oxidation temperature: ThePb-generation–stress relationship;Physical Review B;1993-07-15

5. A new furnace for thin‐film stress experiments;Review of Scientific Instruments;1992-04

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