Interaction of metals with semiconductor surfaces
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference75 articles.
1. Surface spectroscopy of Schottky-barrier formation on Si(111) 7 × 7: Photoemission studies of filled surface states and band bending
2. Electron energy loss spectroscopy of the Si(111)—simple-metal interface
3. Coupled Interface Plasmons of Al Films on CdSe and CdS
4. Transition in Schottky Barrier Formation with Chemical Reactivity
5. Chemical reaction and charge redistribution at metal–semiconductor interfaces
Cited by 26 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Interfacial mixing in as-deposited Si/Ni/Si layers analyzed by x-ray and polarized neutron reflectometry;Applied Surface Science;2012-12
2. Heat-resistant barrier and ohmic contacts based on TiBx and ZrBx interstitial phases to microwave diode structures;Semiconductor physics, quantum electronics and optoelectronics;2008-09-15
3. Structure and properties of interphase boundaries of gallium arsenide-metal (dielectric);Russian Physics Journal;1993-10
4. Chemical reactions at metallic and metal/semiconductor interfaces stimulated by pulsed laser annealing;Applied Surface Science;1992-01
5. The growth mode of aluminium on silver (111);Surface Science;1992-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3