SIMPLE — A technique of silicon micromachining using plasma etching-Reference-Cited by-同舟云学术

SIMPLE — A technique of silicon micromachining using plasma etching

Published:1996-12 Issue:3 Volume:57 Page:223-232
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Li Y.X.,French P.J.,Sarro P.M.,Wolffenbuttel R.F.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference26 articles.

1. Silicon as a mechanical material;Petersen,1982

2. Surface micromachining for microsensors and microactuators;Howe;J. Vac. Sci. Technol.,1988

3. Fabrication technology for an integrated surface-micromachined sensor;Core;Solid State Technol.,1993

4. Thick polycrystalline silicon for surface micromechanical applications: deposition, structuring and mechanical characterization;Lange;Sensors and Actuators A,1995

5. SOI (SIMOX) as a substrate for surface micromachining of single crystal silicon sensors and actuators;Diem,1993

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Smart materials for flexible electronics and devices: hydrogel;RSC Advances;2024

2. From Plastic to Silicone: The Novelties in Porous Polymer Fabrications;Journal of Nanomaterials;2015

3. A systematic dry etching process for profile control of quantum dots and nanoconstrictions;Microelectronics Journal;2007-08

4. Fabrication of suspended thermally insulating membranes using frontside micromachining of the Si substrate: characterization of the etching process;Journal of Micromechanics and Microengineering;2003-01-28

5. Fabrication of suspended membranes for thermal sensors using high-density plasma etching;Design, Test, Integration, and Packaging of MEMS/MOEMS 2002;2002-04-19