Microfabrication of freestanding metal structures using graphite substrate

Author:

Makarova Olga V.,Mancini Derrick C.,Moldovan Nicolaie,Divan Ralu,Tang Cha-Mei,Ryding David G.,Lee Richard H.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Adhesion problems in deep-etch X-ray lithography caused by fluorescence radiation from the plating base;Pantenburg;Microelectr. Eng.,1994

2. Enhanced adhesion buffer layer for deep X-ray lithography using hard X-rays;DeCarlo;J. Vac. Sci. Technol. B,1998

3. Alternative resist adhesion and electroplating layers for LIGA process;El-Kholi;Microsyst. Technol.,2000

4. Graphite-based X-ray masks for deep and ultra-deep X-ray lithography;Coane;J. Vac. Sci. Technol. B,1998

5. H. Guckel, T.R. Christenson, K. Skrobis, Formation of microstructures using a preformed photoresist, US Patent 5,378,583 (1995).

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