Plasma enhanced chemical vapor deposition silicon oxynitride optimized for application in integrated optics-Reference-Cited by-同舟云学术

Plasma enhanced chemical vapor deposition silicon oxynitride optimized for application in integrated optics

Published:1999-04 Issue:1-3 Volume:74 Page:9-12
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Wörhoff K.,Driessen A.,Lambeck P.V.,Hilderink L.T.H.,Linders P.W.C.,Popma Th.J.A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference11 articles.

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3. Low-loss fiber-matched low-temperature PECVD waveguides with small core dimensions for optical communication systems;Hoffmann;IEEE Photon. Technol. Lett.,1997

4. J. Hübner, D. Zauner, M. Kristensen, Low cross talk planar multichannel add-drop multiplexer based on sampled Bragg gratings, Technical Digest, Optical Fiber Communication Conference, San Jose, USA, Feb. 22 to 27, 1998.

5. K. Wörhoff, P.V. Lambeck, R.M. de Ridder, A. Driessen, Application of silicon oxynitride in telecommunication devices, Proceedings IEEE/LEOS Benelux Chapter, Eindhoven, The Netherlands, Nov. 26, 1997, 153–156.

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