Poiseuille number for the fully developed laminar flow through hexagonal ducts etched in 〈1 0 0〉 silicon-Reference-Cited by-同舟云学术

Poiseuille number for the fully developed laminar flow through hexagonal ducts etched in 〈1 0 0〉 silicon

Published:2001-05 Issue:1-2 Volume:90 Page:96-101
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Damean N.,Regtien P.P.L.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference24 articles.

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3. W.M. Rohsenow, J.P. Harnett, Y.I. Cho, Handbook of Heat Transfer, 3rd Edition, McGraw-Hill, New York, 1998.

4. Experimental and numerical investigation into the flow characteristics of channels etched in 〈1 0 0〉 silicon;Flockhart;J. Fluid. Eng.-T. ASME,1998

5. Three-dimensional conjugate heat transfer in the microchannel heat sink for electronic packaging;Fedorov;Int. J. Heat Mass Transfer,2000

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