Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference2 articles.
1. Lithographic lens testing: analysis of measured aerial images, interferometric data and photoresist measurements;Flagello;SPIE,1996
2. P. Dirksen, “Latent image metrology for production wafer steppers”, SPIE 2440, p. 701–710
Cited by
11 articles.
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