Characterization of thin TiSi2 films by spectroscopic ellipsometry and thermal wave analysis-Reference-Cited by-同舟云学术

Characterization of thin TiSi2 films by spectroscopic ellipsometry and thermal wave analysis

Published:1997-11 Issue: Volume:37-38 Page:455-460
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Kasko I.,Kal S.,Ryssel H.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference12 articles.

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5. Integration of in situ spectral ellipsometry with MMST machine control;Maaung;IEEE Trans. Sem. Man.,1994

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