Author:
Baron T.,Mazen F.,Busseret C.,Souifi A.,Mur P.,Fournel F.,Séméria M.N.,Moriceau H.,Aspard B.,Gentile P.,Magnea N.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference8 articles.
1. Self-Assembling Formation of Silicon Quantum Dots by Low Pressure Chemical Vapor Deposition
2. Si Quantum Dot Formation with Low-Pressure Chemical Vapor Deposition
3. B.H. Choi, S.W. Hwang, I.G. Kim, H.C. Shin, Y. Kim, K. Kim, APL, 73 (21) 3129 (1998).
4. I.G. Kim, S. Han, H. Kim, J. Lee, B. Choi, S. Hwang, D. Ahn, H. Shin, IEDM 111 (1998).
5. Silicon quantum dot nucleation on Si3N4, SiO2 and SiOxNy substrates for nanoelectronic devices
Cited by
44 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献