The Structure of Vapor-Deposited Materials-Reference-Cited by-同舟云学术

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The Structure of Vapor-Deposited Materials

Published:2016 Issue: Volume: Page:
ISSN:
Container-title:Reference Module in Materials Science and Materials Engineering
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Author:

Barber Z.H.

Publisher

Elsevier

Reference11 articles.

1. Morphological evolution during epitaxial thin film growth: Formation of 2D islands and 3D mounds;Evans;Surf. Sci. Rep.,2006

2. Influence of ion energy and substrate temperature on the structure of copper, germanium, and zinc films produced by ion plating;Fountzoulas;J. Vac. Sci. Technol. A,1991

3. Grain size and growth of Ni-rich Ni–Al alloy films;Hentzell;Acta Metall.,1983

4. Development of a novel structure zone model relating to the closed-field unbalanced magnetron sputtering system;Kelly;J. Vac. Sci. Technol. A,1998

5. The microstructure of vapor deposited thin films;Leamy,1980

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhancing Tool Performance in High-Speed End Milling of Ti-6Al-4V Alloy: The Role of AlCrN PVD Coatings and Resistance to Chipping Wear;Journal of Manufacturing and Materials Processing;2024-03-29

2. Study of wear performance and tribological characterization of AlTiN PVD coatings with different Al/Ti ratios during ultra-high speed turning of stainless steel 304;International Journal of Refractory Metals and Hard Materials;2021-04

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