1. Nanoscale manufacturing enabled by imprint lithography;Sreenivasan;MRS Bulletin,2008
2. 2D photonic crystal patterning for high volume LED manufacturing;Hershey;Proceedings of SPIE: Microlithography,2006
3. Schmid G., Doyle G., Miller M., Resnick D., 2007. Fabrication of dense sub-20 nm pillar arrays on fused silica imprint templates. In: Presented at the EIPBN Conference, June 2007, Denver, CO, USA.
4. International Technology Roadmap for Semiconductors. Available at: http://www.itrs.net
5. Full-field imprinting of sub-40-nm patterns;Yeo;Proceedings of SPIE: Advanced Lithography, Emerging Lithographic Technologies XII,2008