Study of boron doped amorphous silicon lightly hydrogenated prepared by DC magnetron sputtering for infrared detectors applications-Reference-Cited by-同舟云学术

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Study of boron doped amorphous silicon lightly hydrogenated prepared by DC magnetron sputtering for infrared detectors applications

Published:2021-03 Issue: Volume:113 Page:103556
ISSN:1350-4495
Container-title:Infrared Physics & Technology
language:en
Short-container-title:Infrared Physics & Technology

Author:

Ketroussi Khadidja,Cherfi Rabah,Yahia Seba Hadj,Tata Sonia,Chabane Lamia,Ozyuzer Lutfi,Rahal Abla

Publisher

Elsevier BV

Subject

Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference45 articles.

1. Influence of microstructure and composition on hydrogenated silicon thin film properties for uncooled microbolometer applications;Saint John;J. Appl. Phys.,2011

2. Colloidal quantum dots for thermal infrared sensing and imaging;Hafiz;NANO Converg.,2019

3. Electrical properties of plasma enhanced chemical vapor deposition a-Si:H and a-Si 1−x C x :H for microbolometer applications;Shin;J. Appl. Phys.,2013

4. VO x -based uncooled micrbolometric detectors: recent developments at SCD;Fraenkel;Infrared Technol. Appl. XXXII.,2006

5. Amorphous silicon microbolometer technology;Syllaios;Mat. Res. Soc. Symp.,2000

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1. Mechanism of high qualified Mn-Co-Ni-O thin films grown at low temperature;Applied Surface Science;2024-01

2. Impact of La3+ doping on temperature coefficient of resistivity and peak temperature of La x Ca0.89-xSr0.11MnO3 films prepared by sol-gel spin coating method;Thin Solid Films;2023-06

3. Investigating the Effect of Process Parameter on the Properties of Rf Sputtered pSi Thin Film by Taguchi and ANOVA Analysis;Silicon;2022-10-26

4. Optimization of temperature coefficient of resistance of Al-doped vanadium oxide thin film prepared by atomic layer deposition for uncooled microbolometer;Ceramics International;2022-06

5. Noise Improvement of a-Si Microbolometers by the Post-Metal Annealing Process;Sensors;2021-10-10

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